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Implant (4" & 6" capability)

Implant (4" & 6" capability)

  • Company
  • About Us
  • Process Capability - Technology Platforms
    • Diffusion/Deposition (6")
    • Diffusion, Thin Films & Implant
    • PECVD
    • Physical Vapour Deposition
    • PVD- Fab3
    • Implant (4" & 6" capability)
    • Dry Isotropic Etch
    • Wafer Bonding
    • Plasma Etch (6")
    • Photo Lithography
    • Metrology
    • Wet Chemical Etch
    • Deep Reactive Ion Etching (DRIE)
  • Quality Assurance
  • Who We Work With
  • Board
  • Business Team

Implant (4" & 6" capability)

Low and high dose implants for Boron, Phosphorous and Arsenic

News

MEMS Executive Congress ; March 21st - 22nd 2012

13 Feb 2012

Semefab will be exhibiting at the MEMS UK exhibiton at

Read more>>

Semicon China 2012 ; March 20th - 22nd 2012

13 Feb 2012

Semefab will be exhibiting at the MEMS UK exhibiton at

Read more>>

Reedholm

16 Sep 2011

Semefab will be exhibiting at the MEMS UK exhibiton at

Read more>>

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Semefab Logo

Newark Road South
Eastfield Industrial Estate
Glenrothes
KY7 4NS
Fife
Scotland
UK

Tel:+44 1592 630630
Fax:+44 1592 775265
Email:info@semefab.com